[2405.11717] Can we improve the energy efficiency of EUV lithography?

A preprint by Tsumoru Shintake proposes a simple, low-cost two-mirror EUV projector that would cut the required EUV source power by a factor of 10 compared with current six-mirror EUV projectors. The paper states that the design needs 20 watts of EUV power for a process speed of 100 wafers per hour. It describes a cylindrical tube configuration similar to a DUV projector, with a theoretical resolution limit of 24 nm over a 20 mm field at 0.2 NA and 16 nm over a 10 mm field at 0.3 NA, using a curved-surface mask to reduce tool height.